Last week from the head of Intel sounded another promise to return “Moore’s law” of the old rails that would move to a new process technology every two or two and a half years. At the IEDM conference, revealed that Intel chooses a higher rate to change the process for the next ten years. For example, if the 5-nm process technology will be developed by 2023 to 2029, the company expects to move to the 1.4-nm technology.
Representative site AnandTech managed to capture this slide from the presentation of Intel at the conference, the IEDM. It becomes obvious that the range of two to two and a half years, the company has chosen a more ambitious option in the frequency of the change process. As previously stated by representatives of the processor, the architectural solution should not be tied to a specific stage of lithography. On the slide, this principle is realized in the ability to move products originally planned for release on more advanced technology, “a step back” to the previous process.
Implement lithography with superrigid ultraviolet (EUV), as already mentioned, Intel is going in 2021 in the 7-nm process. The head of Intel has recently confirmed that the first 7-nm the product will be released in late 2021. In its development, each process must go through three phases. A year after the debut should see a variation with a “plus” in the legend, two years later – with two “pluses”. In the same year should be realized, the transition to more advanced lithographic standards, their development will go overlapped.
Tellingly, for 2023 the planned development of some new “lithographic features.” Considering that this period in the chart of Intel is associated with the development of the 5-nm technology, and ASML by the time to start the production of lithographic scanners of new generation, then we are certainly talking about EUV-lithography with a high value of numerical aperture (High-NA EUV). In addition, on the way to the development of a 1.4-nm process technology Intel will have to experiment with the use of new materials and semiconductor structures. What matters is that the end of this path, the company became a victim of his ambitions once again, as happened in history with a 10-nm process technology.